Published July 2012 | Version v1
Journal article

Hemispherical total emissivity of Hastelloy N with different surface conditions

  • 1. Particulate Systems Research Center, Nuclear Science and Engineering Institute, University of Missouri, Columbia, MO 65211 (United States)

Description

The hemispherical total emissivity of Hastelloy N (a candidate structural material for Next Generation Nuclear Plants (NGNPs), particularly for the molten fluoride cooled reactors) was measured using an experimental set-up that was constructed in accordance with the standard ASTM C835-06. The material surface conditions included: (i) 'as received' (original) sample from the supplier; (ii) samples with increased surface roughness through sand blasting; (iii) oxidized surface, and (iv) samples coated with graphite powder. The emissivity of the as received samples varied from around 0.22 to 0.28 in the temperature range of 473 K to 1498 K. The emissivity increased when the roughness of the surface increased compared to an as received sample. When Hastelloy N was oxidized in air at 1153 K or coated with graphite powder, its emissivity increased substantially. The sample sand blasted with 60 grit beads and sprinkled with graphite powder showed an increase of emissivity from 0.2 to 0.60 at 473 K and from 0.25 to 0.67 at 1473 K. The oxidized surface showed a similar behavior: an increase in emissivity compared to an unoxidized sample. This increase in emissivity has strong favorable safety implications in terms of decay heat removal in post-accident environments. The data were compared with another Hastelloy family member, Hastelloy X.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.jnucmat.2012.03.026

Additional details

Identifiers

DOI
10.1016/j.jnucmat.2012.03.026;
PII
S0022-3115(12)00147-X;

Publishing Information

Journal Title
Journal of Nuclear Materials
Journal Volume
426
Journal Issue
1-3
Journal Page Range
p. 85-95
ISSN
0022-3115
CODEN
JNUMAM

Optional Information

Copyright
Copyright (c) 2012 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.