Published March 15, 2004 | Version v1
Journal article

Optical properties of stacked Ge/Si quantum dots with different spacer thickness grown by chemical vapor deposition

Description

Photoluminescence spectroscopy has been used to study the optical properties of multiple stacked Ge/Si quantum dots (QDs) with different thickness of Si spacers inserted between the Ge dot layers. According to the emission energy of the stacked Ge/Si QDs, we found that thinner spacer will lead to significant material intermixing. Such intermixing degrades the interface sharpness and the hole confinement depth of the dots. The thermal activation energy of PL intensity quenching for different spacer thicknesses also confirms this finding. We point out that thinner spacer is in fact detrimental to the emission properties of the stacked Ge/Si QDs. To obtain better luminescence efficiency at room temperature, the influence of the material intermixing on stacked Ge/Si QDs should be minimized

Additional details

Identifiers

DOI
10.1016/j.apsusc.2003.08.040;
PII
S0169433203010754;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
224
Journal Issue
1-4
Journal Page Range
p. 148-151
ISSN
0169-4332
CODEN
ASUSEE

Conference

Title
1. international SiGe technology and device meeting - From materials and process technology to device and circuit technology
Acronym
ISTDM 2003
Dates
15-17 Jan 2003
Place
Nagoya (Japan)

Optional Information

Copyright
Copyright (c) 2003 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.