Published June 2, 2003 | Version v1
Journal article

Properties of Cr(C,N) hard coatings deposited in Ar-C2H2-N2 plasma

Description

Several chromium carbonitride (Cr-(C,N)) coatings were prepared with different C:N ratios by varying the N2 and C2H2 flow. Chromium nitride (Cr-N) and chromium carbide (Cr-C) coatings were also prepared for comparison. The coatings were deposited in two different ion-plating systems: by reactive evaporation in BAI730M (Balzers) apparatus at high temperature (450 deg. C) and by reactive sputtering in plasma-beam Sputron (Balzers) apparatus at low temperature (200 deg. C). Among mechanical properties microhardness, adhesion (measured by scratch test) and surface roughness were evaluated. Oxidation of the coatings was carried out by heating the samples at temperatures of 750-900 deg. C in an oxygen atmosphere. Crystal structure and microstructure were studied by XRD, TEM and SEM. Chemical State of the elements was observed by XPS. The concentration and depth profiles of the samples oxidized at various temperatures were measured by AES, EDX and GDOES

Additional details

Identifiers

DOI
10.1016/S0040-6090;
PII
S0040609003003286;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
433
Journal Issue
1-2
Journal Page Range
p. 174-179
ISSN
0040-6090
CODEN
THSFAP

Conference

Title
12. international conference on thin films
Dates
15-20 Sep 2002
Place
Bratislava (Slovakia)

Optional Information

Copyright
Copyright (c) 2003 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.