Published October 11, 1991 | Version v1
Patent

Gas bubbling cleaning method

Description

The present invention concerns a gas bubbling cleaning method for objects to be cleaned having complicate shapes such as reactor equipments. For instance, air is used as the gas, while water is used as the cleaning fluid. A jetting air is jetted out to an object to be cleaned from an air bubbling nozzle disposed below the object. This constitutes air/water two phase flow near the object to be cleaned, to generate a three dimensional circulating flow. The distance between the inner wall surface of a cleaning vessel and the object to be cleaned is set to greater than 5 mm, and the ratio between the air flow rate and the horizontal cross section of the cleaning vessel is set to 0.1 to 0.4m/sec. This enables to enter an appropriate amount of bubbles to the air at the inside of the object to be cleaned having a complicate shape. Accordingly, deposits adhered to the inside of the object to be cleaned can be eliminated and cleaned effectively. (I.N.)

Availability note (English)

Available from JAPIO. Also available from INPADOC.

Additional details

Publishing Information

Imprint Pagination
8 p.
IPC:
Int. Cl. G21F9/28; B08B3/10.
IPC
Int. Cl. G21F9/28; B08B3/10.
Patent number
JP patent document 3-229200/A/

INIS

Country of Publication
Japan
Country of Input or Organization
Japan
INIS RN
23039842
Subject category
S22: GENERAL STUDIES OF NUCLEAR REACTORS;
Resource subtype / Literary indicator
Non-conventional Literature
Descriptors DEI
AIR; BUBBLES; CLEANING; CONTAINERS; FLOW RATE; GASES; NOZZLES; REACTOR COMPONENTS; SIZE; WATER
Descriptors DEC
FLUIDS; HYDROGEN COMPOUNDS; OXYGEN COMPOUNDS

Optional Information

Secondary number(s)
JP patent application 2-281978.