Fabrication of high-aspect-ratio micropatterns in soluble block-copolymer polyimides by a UV-assisted thermal imprint process

High-aspect-ratio microstructures (HARMS) of polyimides have many applications, such as components of microelectromechanical systems and X-ray gratings. This study demonstrates the fabrication of HARMS with vertical and smooth sidewalls in a thick, soluble block-copolymer polyimide (SBCP) film by an UV-assisted thermal imprint process. A preheating condition was controlled as a parameter that dominated the imprint pattern fidelity. After investigating a proper prebaking condition, patterns with a width of 3.4 μm and a height of 35.1 μm with a high-aspect ratio of 10 were successfully structured in an SBCP film that has a thickness of approximately a hundred micrometers. The process has potential as a low-cost fine pattern fabrication process for polyimide-based polymers.