Published April 2014 | Version v1
Journal article

The dependence of Raman scattering on Mg concentration in Mg-doped GaN grown by MBE

  • 1. Silanna Semiconductor, 8 Herb Elliott Avenue, Sydney Olympic Park, 2127, NSW (Australia)

Description

Magnesium-doped GaN (GaN:Mg) films having Mg concentrations in the range 5 × 1018–5 × 1020 cm−3 were fabricated by molecular beam epitaxy. Raman spectroscopy was employed to study the effects of Mg incorporation on the positions of the E2 and A1(LO) lines identifiable in the Raman spectra. For Mg concentrations in excess of 2 × 1019 cm−3, increases in the Mg concentration shift both lines to higher wave numbers. The shifts of the Raman lines reveal a trend towards compressive stress induced by incorporation of Mg into the GaN films. The observed correlation between the Mg concentration and the Raman line positions establish Raman spectroscopy as a useful tool for optimizing growth of Mg-doped GaN. (papers)

Availability note (English)

Available from http://dx.doi.org/10.1088/2053-1591/1/2/025901

Additional details

Identifiers

Publishing Information

Journal Title
Materials Research Express (Online)
Journal Volume
1
Journal Issue
2
Journal Page Range
[7 p.]
ISSN
2053-1591