Published January 2006 | Version v1
Journal article

Ignition and dynamics of high-voltage glow discharge plasma implantation

  • 1. Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong (China)
  • 2. State Key Laboratory of Welding Production Technology, Harbin Institute of technology, Harbin (China)

Description

The self-ignition and dynamics of glow discharge plasma in the pulsed high-voltage plasma immersion ion implantation mode have been investigated. After ignition during the pulse-on period, the glow discharge continues to be sustained for a long period of time after the high-voltage pulse has been turned off as monitored by a Langmuir probe. The glow discharge and ignition lie on the left side of the Paschen curve when pd (gas pressure times electrode separation) is adjusted by using different anode to cathode distances utilizing a conducting grounded grid. The increased or constant implantation current I a reveals that the ion sheath is stable and conforms to the cathode structure as the plasma density increases by one to two orders of magnitude towards the anode. In addition, the duration of the post-pulse-off plasma can be as long as several times of the pulse duration. The ignition time and duration of the plasma depend on the working pressure, applied voltage and pulse duration

Additional details

Identifiers

DOI
10.1016/j.nimb.2005.08.033;
PII
S0168-583X(05)01523-5;

Publishing Information

Journal Title
Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
Journal Volume
242
Journal Issue
1-2
Journal Page Range
p. 275-278
ISSN
0168-583X
CODEN
NIMBEU

Conference

Title
14. international conference on ion beam modification of materials
Dates
5-10 Sep 2004
Place
Pacific Grove, CA (United States)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
37068435
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ANODES; CATHODES; CURRENTS; DEPOSITION; ELECTRIC POTENTIAL; GLOW DISCHARGES; GRIDS; IGNITION; ION IMPLANTATION; IONS; LANGMUIR PROBE; PASCHEN LAW; PLASMA; PLASMA DENSITY; PULSES
Descriptors DEC
CHARGED PARTICLES; ELECTRIC DISCHARGES; ELECTRIC PROBES; ELECTRODES; PROBES

Optional Information

Copyright
Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.