The Effects of Electroless Nickel Plating Bath Conditions on Stability of Solution and Properties of Deposit

Electroless depositions of nickel were conducted in different bath conditions to find optimum conditions of electroless nickel plating at low operating temperature and pH. The effect of complexing reagent on stability of plating solution was investigated. Sodium citrate complexed plating solution is more stable than sodium pyrophosphate complexed solution. The effects of nickel salt concentration, reducing agent, complexing agent and inhibitor on deposition rate was investigated. The effects of pH on deposition rate and content of phosphorous in deposited nickel were also analyzed. Electroless deposited nickel become crystallized with increasing pH due to lower phosphorous content. In optimum operating bath condition, deposition rate was 7 μm/hr at 60 .deg. C and pH 10.0 without stabilizer. The rate was decreased with stabilizer concentration