Stacked Fresnel Zone Plates for High Energy X-rays

A stacking technique was developed in order to increase focusing efficiency of Fresnel zone plates (FZP) at high energies. Two identical Si chips each of which containing 9 FZPs were used for stacking. Alignment of the chips was achieved by on-line observation of the moire pattern. The formation of moire patterns was studied theoretically and experimentally at different experimental conditions. To provide the desired stability Si-chips were bonded together with slow solidification speed epoxy glue. A technique of angular alignment in order to compensate a linear displacement in the process of gluing was proposed. Two sets of stacked FZPs were experimentally tested to focus 15 and 50 keV x rays. The gain in the efficiency by factor 2.5 was demonstrated at 15 keV. The focal spot of 1.8 μm vertically and 14 μm horizontally with 35% efficiency was measured at 50 keV. Forecast for the stacking of nanofocusing FZPs was discussed