Published 1996 | Version v1
Miscellaneous Metadata-only

The study of ion implantation effect on the oxidizing property of the GH903 alloy by slow positron beam

Creators

  • 1. Academia Sinica, SH (China). Shanghai Inst. of Nuclear Research, Laboratory of Nuclear Analysis Techniques Shanghai Division
  • 2. Shanghai 5th Factory of Iron and Steel (China)
  • 3. China Science and Technology Univ., Hefei (China)

Description

no abstract available

Part of:
Laboratory of nuclear analysis techniques academia sinica annual report (1995)

Additional details

Publishing Information

Imprint Title
Laboratory of nuclear analysis techniques academia sinica annual report (1995)
Imprint Pagination
100 p.
Journal Page Range
p. 55-56

INIS

Country of Publication
China
Country of Input or Organization
China
INIS RN
31032174
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Non-conventional Literature, No Abstract
Descriptors DEI
CHEMICAL PROPERTIES; CHROMIUM IONS; ION IMPLANTATION; NICKEL BASE ALLOYS; OXIDATION; STABILITY; YTTRIUM IONS
Descriptors DEC
ALLOYS; CHARGED PARTICLES; CHEMICAL REACTIONS; IONS; NICKEL ALLOYS; TRANSITION ELEMENT ALLOYS

Optional Information