Published July 2006
| Version v1
Journal article
Cluster size dependence of the secondary ion yields produced by large Ar cluster ion beam
- 1. Kyoto Univ., Dept. of Nuclear Engineering, Kyoto (Japan)
- 2. Kyoto Univ., Quantum Science and Engineering Center, Uji, Kyoto (Japan)
Description
In this study we focused on secondary ion emission that is one of the interactions between incident ions and solids, and investigated the cluster size dependence of secondary ion yields with large cluster ion. Secondary ion yields were measured for Si targets bombarded with large Ar cluster ions at incident energies between 10 and 20 keV. Secondary ions were analyzed using a time-of-flight technique, and the effect of incident ion size and 'nonlinear effects' of Si+ yields were studied. (author)
Additional details
Publishing Information
- Journal Title
- Annual Report of Quantum Science and Engineering Center
- Journal Volume
- 8
- Journal Page Range
- p. 61-64
- ISSN
- 1345-0700
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 38007295
- Subject category
- S74: ATOMIC AND MOLECULAR PHYSICS;
- Descriptors DEI
- ARGON IONS; ATOMIC CLUSTERS; CLUSTER BEAM INJECTION; CLUSTER EMISSION MODEL; ION EMISSION; ION PAIRS; KEV RANGE 10-100; MONOMERS; NONLINEAR PROBLEMS; SECONDARY EMISSION; SILICON 29 TARGET; SIZE; TIME-OF-FLIGHT METHOD; YIELDS
- Descriptors DEC
- BEAM INJECTION; CHARGED PARTICLES; EMISSION; ENERGY RANGE; IONS; KEV RANGE; MATHEMATICAL MODELS; MULTIPERIPHERAL MODEL; PARTICLE MODELS; PERIPHERAL MODELS; TARGETS
Optional Information
- Notes
- 4 refs., 6 figs.