Published November 2017
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Fundamental properties of the counter-facing plasma focus device for extreme ultra-violet light source
- 1. IHI Corp., Research Laboratory, Yokohama, Kanagawa (Japan)
- 2. Tokyo Inst. of Technology, Dept. of Energy Sciences, Yokohama, Kanagawa (Japan)
Description
Fundamental properties of a counter-facing plasma focus device were characterized. The plasma dynamics in the device, the out-put energy, the spectra from plasma, images of the plasma radiation, and the recovery rate of electrical insulation, were investigated using a proof-of-principle experimental device. All of the results indicated that the device has potentiality as a high average power extreme ultraviolet light source for the next generation lithography system. (author)
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Additional details
Publishing Information
- Imprint Title
- Recent progress of pulsed power technology and its application to high energy density plasma
- Imprint Pagination
- [106 p.]
- Journal Page Range
- p. 53-57
- Report number
- NIFS-PROC--107
Conference
- Title
- Symposium on 'recent progress of pulsed power technology and its application to high energy density plasma'
- Dates
- 7-8 Jan 2016
- Place
- Toki, Gifu (Japan)
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 50017669
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ELECTRIC CURRENTS; ELECTRIC DISCHARGES; ELECTRODES; ELECTRON TEMPERATURE; ENERGY DENSITY; EXTREME ULTRAVIOLET RADIATION; ION TEMPERATURE; LASER RADIATION; LIGHT SOURCES; LITHIUM IONS; PLASMA DENSITY; PLASMA FOCUS DEVICES; PULSE GENERATORS; SEMICONDUCTOR MATERIALS; WAVELENGTHS
- Descriptors DEC
- CHARGED PARTICLES; CURRENTS; ELECTROMAGNETIC RADIATION; ELECTRONIC EQUIPMENT; EQUIPMENT; FUNCTION GENERATORS; IONS; MATERIALS; OPEN PLASMA DEVICES; RADIATION SOURCES; RADIATIONS; THERMONUCLEAR DEVICES; ULTRAVIOLET RADIATION
Optional Information
- Notes
- 10 refs., 6 figs.