Determination of intrinsic mobility of a bilayer oxide thin-film transistor by pulsed I – V method
- 1. Department of Applied Physics, Korea University, 2511, Sejongro, Sejong, 339-700 (Korea, Republic of)
Description
Amorphous oxide semiconductor thin-film transistors (TFT) have been considered as outstanding switch devices owing to their high mobility. However, because of their amorphous channel material with a certain level of density of states, a fast transient charging effect in an oxide TFT occurs, leading to an underestimation of the mobility value. In this paper, the effects of the fast charging of high-performance bilayer oxide semiconductor TFTs on mobility are examined in order to determine an accurate mobility extraction method. In addition, an approach based on a pulse I D –V G measurement method is proposed to determine the intrinsic mobility value. Even with the short pulse I D –V G measurement, a certain level of fast transient charge trapping cannot be avoided as long as the charge-trap start time is shorter than the pulse rising time. Using a pulse-amplitude-dependent threshold voltage characterization method, we estimated a correction factor for the apparent mobility, thus allowing us to determine the intrinsic mobility. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/1361-6528/aa651cAdditional details
Identifiers
Publishing Information
- Journal Title
- Nanotechnology (Print)
- Journal Volume
- 28
- Journal Issue
- 17
- Journal Page Range
- [7 p.]
- ISSN
- 0957-4484
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 51004865
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY;
- Descriptors DEI
- AMPLITUDES; DENSITY; ELECTRIC POTENTIAL; OXIDES; PERFORMANCE; PULSE RISE TIME; SEMICONDUCTOR MATERIALS; THIN FILMS; TRANSIENTS; TRANSISTORS; TRAPPING
- Descriptors DEC
- CHALCOGENIDES; FILMS; MATERIALS; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; SEMICONDUCTOR DEVICES; TIMING PROPERTIES