On growth of YBa2Cu3O7-x thin films by sputtering ion beam from discharge with the use of cold electrodes

Modification of a discharge chamber for growing YBa2Cu3O7-x films by sputtering with ion beam is proposed. It is shown that it is advisable not to use copper but steel cathodes coated with copper. Cathodes of HTSC powder are perspective for provision of high critical parameters of thin films grown. Temperature dependences of electric resistence of YBa2Cu3O7-x films produced using steel and copper cathodes are presented. Steel cathodes allow one to produce films with the start of a superconducting transition at 75-78 K and a wide interval of 40-45 K transition which is referred to film contamination with iron