Published June 15, 2017 | Version v1
Journal article

Growth, microstructure and thermal transformation behaviour of epitaxial Ni-Ti films

  • 1. IFW Dresden, P.O. Box 270116, 01171 Dresden (Germany)
  • 2. Institute of Materials Science and Engineering, Chemnitz University of Technology, 09107 Chemnitz (Germany)
  • 3. Institute of Physics, Chemnitz University of Technology, 09107 Chemnitz (Germany)

Description

Epitaxial films have the potential to be used as model systems for fundamental investigations on the martensitic transformation in binary NiTi. In this paper, we discuss growth of binary NiTi thin films on single crystalline MgO substrates. Sputter deposition is used to grow NiTi films. Films prepared by complementary preparation routes (with different deposition temperatures and subsequent heat treatments) are investigated by X-ray diffraction, electron microscopy, atomic force microscopy, and electrical resistivity measurements, with the aim of optimizing film properties, particularly to obtain a well defined orientation of the austenitic unit cell and smooth surfaces. Our results show that deposition at elevated temperatures and carefully controlled subsequent heat treatments allow to produce epitaxially grown and smooth NiTi films that exhibit reversible one- or two-step martensitic transformations.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.actamat.2017.04.049

Additional details

Identifiers

DOI
10.1016/j.actamat.2017.04.049;
PII
S1359-6454(17)30341-5;

Publishing Information

Journal Title
Acta Materialia
Journal Volume
132
Journal Issue
Complete
Journal Page Range
p. 255-263
ISSN
1359-6454
CODEN
ACMAFD

Optional Information

Copyright
Copyright (c) 2017 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.