Published September 2018 | Version v1
Journal article

Correlation Between 3-D Surface Topography and Different Deposition Times of Engineered Ni@a-C:H Thin Films

  • 1. University of Silesia, Faculty of Computer Science and Materials Science, Institute of Informatics, Department of Biomedical Computer Systems (Poland)
  • 2. The Technical University of Cluj-Napoca, The Directorate of Research, Development and Innovation Management (DMCDI) (Romania)
  • 3. Islamic Azad University, Young Researchers and Elite Club, Kermanshah Branch (Iran, Islamic Republic of)
  • 4. Islamic Azad University, Young Researchers and Elite Club, Arak Branch (Iran, Islamic Republic of)

Description

This study is aimed at analyzing the surface micromorphology of amorphous hydrogenated carbon layers containing nickel nanoparticles (Ni-NPs@a-C:H) within their structure, which were sputtered by co-deposition of RF-Sputtering and RF-PECVD method from acetylene gas and nickel target on glass substrates. Prepared films were then used as research material following their deposition time at three different times of 3, 7 and 13 minutes. Series of height samples were taken with the help of atomic force microscopy (AFM) operating in a non-contact mode and examined in order to determine their surface engineering characteristics. The analysis of 3-D surface texture helps to understand their essential characteristics and their implications as well as graphicalmodels and their implementation in computer simulation.

Additional details

Identifiers

Publishing Information

Journal Title
Silicon (Print)
Journal Volume
10
Journal Issue
5
Journal Page Range
p. 2141-2151
ISSN
1876-990X

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Copyright (c) 2018 Springer Science+Business Media B.V., part of Springer Nature