Published February 15, 2012 | Version v1
Journal article

Ion beam nanoscale fabrication and lithography - A review

  • 1. IBM Almaden Research Center, 650 Harry Rd., San Jose, CA 95120 (United States)

Description

This review discusses some of the issues that will govern future commercial adoption of ion beam nanoscale fabrication and lithography, with special reference to some major fields of application. Selected recent research advances are highlighted, as they indicate new experimental successes, new insights into complex ion interaction mechanisms, and a fast evolving variety of advanced instrumentation and fabrication resources. It is evident that robust fabrication involving few-nanometer features will be enabled by strategic applications of ion beams, especially if they can be coupled with directed self-assembly.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2011.11.074

Additional details

Identifiers

DOI
10.1016/j.apsusc.2011.11.074;
PII
S0169-4332(11)01832-0;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
258
Journal Issue
9
Journal Page Range
p. 4103-4111
ISSN
0169-4332
CODEN
ASUSEE

Conference

Title
International conference on ion-beam induced nanopatterning of materials
Acronym
IINM-2010
Dates
6-10 Feb 2011
Place
Bhubaneswar (India)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
44031321
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
CRYSTAL DEFECTS; FABRICATION; INTERACTIONS; ION BEAMS; ION IMPLANTATION; IONS; NANOSTRUCTURES; NOISE; PROXIMITY EFFECT; RESOURCES; REVIEWS; ROUGHNESS; SURFACES
Descriptors DEC
BEAMS; CHARGED PARTICLES; CRYSTAL STRUCTURE; DOCUMENT TYPES; SURFACE PROPERTIES

Optional Information

Copyright
Copyright (c) 2011 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.