Published February 15, 2012
| Version v1
Journal article
Ion beam nanoscale fabrication and lithography - A review
Creators
- 1. IBM Almaden Research Center, 650 Harry Rd., San Jose, CA 95120 (United States)
Description
This review discusses some of the issues that will govern future commercial adoption of ion beam nanoscale fabrication and lithography, with special reference to some major fields of application. Selected recent research advances are highlighted, as they indicate new experimental successes, new insights into complex ion interaction mechanisms, and a fast evolving variety of advanced instrumentation and fabrication resources. It is evident that robust fabrication involving few-nanometer features will be enabled by strategic applications of ion beams, especially if they can be coupled with directed self-assembly.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.apsusc.2011.11.074Additional details
Identifiers
- DOI
- 10.1016/j.apsusc.2011.11.074;
- PII
- S0169-4332(11)01832-0;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 258
- Journal Issue
- 9
- Journal Page Range
- p. 4103-4111
- ISSN
- 0169-4332
- CODEN
- ASUSEE
Conference
- Title
- International conference on ion-beam induced nanopatterning of materials
- Acronym
- IINM-2010
- Dates
- 6-10 Feb 2011
- Place
- Bhubaneswar (India)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44031321
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CRYSTAL DEFECTS; FABRICATION; INTERACTIONS; ION BEAMS; ION IMPLANTATION; IONS; NANOSTRUCTURES; NOISE; PROXIMITY EFFECT; RESOURCES; REVIEWS; ROUGHNESS; SURFACES
- Descriptors DEC
- BEAMS; CHARGED PARTICLES; CRYSTAL STRUCTURE; DOCUMENT TYPES; SURFACE PROPERTIES
Optional Information
- Copyright
- Copyright (c) 2011 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.