Published November 2004
| Version v1
Journal article
Collective Thomson scattering experiments on a tin vapor discharge in the prepinch phase
Creators
- 1. ISAN, Troitsk, Moscow Region 142092 (Russian Federation)
- 2. ASML Netherlands B.V., De Run 6501, 5504 DR Veldhoven (Netherlands)
- 3. Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven (Netherlands)
Description
Partially collective Thomson scattering measurements have been performed on a triggered vacuum arc in tin vapor, which is a candidate source of extreme ultraviolet light for application in semiconductor lithography. In this paper, results on the electron densities and temperatures are presented for the prepinch phase of the discharge. Electron densities and temperatures increase from 1x1023 m-3 to 1x1024 m-3 and from 5 eV to over 30 eV, respectively, in about 100 ns. The results are confirmed by Stark broadening data
Additional details
Identifiers
Publishing Information
- Journal Title
- Physical Review. E, Statistical Physics, Plasmas, Fluids, and Related Interdisciplinary Topics
- Journal Volume
- 70
- Journal Issue
- 5
- Journal Page Range
- p. 056413-056413.7
- ISSN
- 1063-651X
- CODEN
- PLEEE8
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 36080211
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- ELECTRON DENSITY; ELECTRON TEMPERATURE; EV RANGE 01-10; EV RANGE 10-100; EXTREME ULTRAVIOLET RADIATION; SEMICONDUCTOR MATERIALS; THOMSON SCATTERING; TIN; VAPORS; VISIBLE RADIATION
- Descriptors DEC
- ELECTROMAGNETIC RADIATION; ELEMENTS; ENERGY RANGE; EV RANGE; FLUIDS; GASES; INELASTIC SCATTERING; MATERIALS; METALS; RADIATIONS; SCATTERING; ULTRAVIOLET RADIATION
Optional Information
- Notes
- (c) 2004 The American Physical Society