Published April 2021 | Version v1
Journal article

Subsurface structural change of silica upon nanoscale physical contact: Chemical plasticity beyond topographic elasticity

  • 1. Department of Chemical Engineering and Materials Research Institute, Pennsylvania State University, PA 16802 (United States)
  • 2. Key Laboratory of Testing Technology for Manufacturing Process, Ministry of Education, Southwest University of Science and Technology, Mianyang, Sichuan 621010 (China)
  • 3. Department of Mechanical Engineering, Pennsylvania State University, PA 16802 (United States)
  • 4. neaspec GmbH, Eglfinger Weg 2, Haar, Munich D-85540 (Germany)
  • 5. Materials Research Institute and Department of Engineering Science & Mechanics, Pennsylvania State University, University Park, PA (United States)

Description

Surface defects or flaws on materials made by physical contacts with foreign objects can deteriorate their mechanical properties and limit technical applications. Thus, understanding the contact-induced subsurface damage is of great importance. Using nanoscale infrared spectroscopy and reactive molecular dynamics simulations, the subsurface structural changes of silica upon nanoindentation and nanoscratch are investigated. The results reveal an elongation of the SiO bond length distribution even after the topographically-elastic contact, indicating a "chemical plasticity" at the sub-Angstrom level. In the plastic region with subsurface densification, the SiO bond is found to be slightly longer than the pristine region, indicating the decrease in molar volume is accompanied with the elongation, not shortening, of the SiO bond. These results elucidate the structural damage of a material upon physical contact cannot be delineated based on the topographic deformation of the surface.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.actamat.2021.116694

Additional details

Identifiers

DOI
10.1016/j.actamat.2021.116694;
PII
S1359645421000744;

Publishing Information

Journal Title
Acta Materialia
Journal Volume
208
Journal Page Range
vp.
ISSN
1359-6454
CODEN
ACMAFD

Optional Information

Copyright
Copyright (c) 2021 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.