Structurally and mechanically tunable molybdenum oxide films and patterned submicrometer structures by electrodeposition
Creators
- 1. Departament de Física, Facultat de Ciències, Universitat Autònoma de Barcelona, E-08193 Bellaterra (Spain)
- 2. Departament d'Electrònica, Facultat de Física, Universitat de Barcelona, C/ Martí i Franquès 1, E-08028, Barcelona (Spain)
- 3. Institució Catalana de Recerca i Estudis Avançats (ICREA) and Departament de Física, Universitat Autònoma de Barcelona, E-08193 Bellaterra (Spain)
Description
Graphical abstract: Display Omitted -- Abstract: 1.5 μm-thick molybdenum oxide films have been electrodeposited potentiostatically from 0.2 M Na2MoO4 electrolyte onto indium tin oxide (ITO)/glass substrates at pH = 1, 6 and 9. The influence of cetyltrimethylammonium bromide (CTAB) surfactant on films' adhesion, morphology, degree of porosity, molybdenum speciation, and crystallographic structure has been systematically investigated. The addition of CTAB (0.01 M) to the bath clearly improves film adherence to the substrate, reduces cracking, and increases crystallinity. This has an impact on the physical properties of the films. In particular, both hardness (H) and Young's modulus (E) increase, as determined from nanoindentation tests. The growth of ordered arrays of molybdenum oxide submicrometer structures, including pillars and stripes, by electrodeposition onto e-beam lithographed Au/Ti/Si substrates is also reported
Availability note (English)
Available from http://dx.doi.org/10.1016/j.electacta.2015.05.112Additional details
Identifiers
- DOI
- 10.1016/j.electacta.2015.05.112;
- PII
- S0013-4686(15)01249-9;
Publishing Information
- Journal Title
- Electrochimica Acta
- Journal Volume
- 173
- Journal Issue
- Complete
- Journal Page Range
- p. 705-714
- ISSN
- 0013-4686
- CODEN
- ELCAAV
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 47066346
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Descriptors DEI
- AMMONIUM COMPOUNDS; ELECTRODEPOSITION; ELECTRON BEAMS; FILMS; HARDNESS; MOLYBDENUM OXIDES; OXIDATION; PHYSICAL PROPERTIES; SUBSTRATES; TIN OXIDES; X-RAY DIFFRACTION
- Descriptors DEC
- BEAMS; CHALCOGENIDES; CHEMICAL REACTIONS; COHERENT SCATTERING; DEPOSITION; DIFFRACTION; ELECTROLYSIS; LEPTON BEAMS; LYSIS; MECHANICAL PROPERTIES; MOLYBDENUM COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; PARTICLE BEAMS; REFRACTORY METAL COMPOUNDS; SCATTERING; SURFACE COATING; TIN COMPOUNDS; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2015 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.