Published July 2007 | Version v1
Journal article

Effect of deposition conditions on nanowhisker morphology

  • 1. Russian Academy of Sciences, St. Petersburg Physical Technical Center for Research and Education (Russian Federation)
  • 2. Russian Academy of Sciences, Institute of Analytical Instrument Making (Russian Federation)
  • 3. CNRS-LPN (France)

Description

The results of theoretical investigation of the effect of deposition conditions on the morphological properties of nanowhiskers (nanowires) in different growth technologies are presented. The dependences of the whisker length on their radius, temperatures, deposition rate, density, and average sizes of droplets (growth catalysts) are obtained. Effective adatom diffusion lengths on the substrate surface are determined under various growth conditions. Theoretical dependences of the nanowhisker length on radius and surface growth temperature are corroborated by experimental data obtained for GaAs whiskers grown by molecular-beam epitaxy on the Au-activated GaAs(111)As surface

Additional details

Identifiers

Publishing Information

Journal Title
Semiconductors
Journal Volume
41
Journal Issue
7
Journal Page Range
p. 865-874
ISSN
1063-7826
CODEN
SMICES

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
39098097
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
DEPOSITION; DIFFUSION LENGTH; GALLIUM ARSENIDES; GOLD; MOLECULAR BEAM EPITAXY; QUANTUM WIRES; WHISKERS
Descriptors DEC
ARSENIC COMPOUNDS; ARSENIDES; CRYSTAL GROWTH METHODS; CRYSTALS; DIMENSIONS; ELEMENTS; EPITAXY; GALLIUM COMPOUNDS; LENGTH; METALS; MONOCRYSTALS; NANOSTRUCTURES; PNICTIDES; TRANSITION ELEMENTS

Optional Information

Copyright
Copyright (c) 2007 Pleiades Publishing, Ltd.