Published October 1, 1981 | Version v1
Journal article

Manufacturing advantages for remote control of medium current ion implant systems

  • 1. IBM Components Div., Hopewell Junction, NY (USA). East Fishkill Lab.

Description

The advantages of remote control of the existing ion implant systems will be discussed. Factors for consideration are, in the order of importance, radiation, maintenance, and environmental control. By removing the controls and monitors from the equipment, operating personnel are moved from a potential radiation area to a radiation-free area and operation can now be classified as 'non-radiation' workers. All system maintenance is performed in the equipment core area without disrupting either the clean room equipment or adjacent equipment. For the system operating in a maintenance mode, the controls rotate 900 into the equipment core area. The wafer load and machine control areas are isolated from the clean room via doors and sliding windows. The remote control modification replaces hand-driven leak valves and control potentiometers with motor drives. The source parameters located at high voltage and previously observed by the operator through a lead window are now monitored by a closed circuit TV system and displayed at the control console. (orig.)

Additional details

Publishing Information

Journal Title
Nucl. Instrum. Methods Phys. Res.
Journal Volume
189
Journal Issue
1
Series
Nucl. Instrum. Methods Phys. Res.
Journal Page Range
187-191
ISSN
0029-554X

Conference

Title
3. international conference on ion implantation equipment and techniques.
Dates
8 - 11 Jul 1980.
Place
Kingston, Canada.

INIS

Country of Publication
Netherlands
Country of Input or Organization
Netherlands
INIS RN
13659566
Subject category
S43: PARTICLE ACCELERATORS;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ION IMPLANTATION; IRRADIATION PLANTS; RADIATION PROTECTION; REMOTE CONTROL
Descriptors DEC
CONTROL; NUCLEAR FACILITIES