Published January 1, 2018 | Version v1
Journal article

Influences of magnetic field on the fractal morphology in copper electrodeposition

  • 1. Research Unit for Mineral Technology, Indonesian Institute of Sciences, Lampung (Indonesia)
  • 2. School of Chemical Engineering, Universiti Sains Malaysia, Pulau Pinang (Malaysia)

Description

Copper magneto-electrodeposition (MED) is used decrease roughening in the copper electrodeposition process. This technology plays a vital role in electrodeposition process to synthesize metal alloy, thin film, multilayer, nanowires, multilayer nanowires, dot array and nano contacts. The effects of magnetic fields on copper electrodeposition are investigated in terms of variations in the magnetic field strength and the electrolyte concentration. Based on the experimental results, the mere presence of magnetic field would result in a compact deposit. As the magnetic field strength is increased, the deposit grows denser. The increment in concentration also leads to the increase the deposited size. The SEM image analysis showed that the magnetic field has a significant effect on the surface morphology of electrodeposits. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1757-899X/285/1/012021

Additional details

Publishing Information

Journal Title
IOP Conference Series. Materials Science and Engineering (Online)
Journal Volume
285
Journal Issue
1
Journal Page Range
[7 p.]
ISSN
1757-899X

Conference

Title
Mineral Processing and Technology International Conference 2017
Dates
23-24 Oct 2017
Place
Jakarta (Indonesia)

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
52069624
Subject category
S36: MATERIALS SCIENCE; S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ALLOYS; COPPER; DEPOSITS; ELECTRODEPOSITION; ELECTROLYTES; FRACTALS; IMAGE PROCESSING; IMAGES; MAGNETIC FIELDS; MORPHOLOGY; NANOWIRES; SCANNING ELECTRON MICROSCOPY; THIN FILMS
Descriptors DEC
DEPOSITION; ELECTROLYSIS; ELECTRON MICROSCOPY; ELEMENTS; FILMS; LYSIS; METALS; MICROSCOPY; NANOSTRUCTURES; PROCESSING; SURFACE COATING; TRANSITION ELEMENTS