Published April 1991 | Version v1
Journal article

A high-voltage modulator for high-power RF source research

  • 1. Plasma Fusion Center, Massachusetts Inst. of Technology, Cambridge, MA (United States)

Description

This paper presents the design, construction, and operating results of a high-voltage modulator system capable of generating 700-kV, 2.5-μs pulses at 5 pps into a load of 900 Ω. The modulator is used to energize a variety of high-power microwave devices requiring voltage stability and reproducibility. Voltage ripple is less than 0.2% during the 1.0-μs flat top, with a shot-to-shot voltage variation of less than 0.1%. The primary circuit consists of two seven-stage tunable Rayleigh- type pulse-forming networks (PFN's) connected in parallel with a total impedance of 2.25 Ω, a total capacitance of 0.56 μF, and a total inductance of 2.8 μH. The PFN is charged by a highly stable 80-kV capacitor charging power supply (0.1% rms voltage ripple) at a rate of 10 kJ/s. The total energy stored (1.5 kJ) is released through an ITT F-187 thyratron into a 20:1 pulse transformer, which generates 700- kV, 2.5-1 μs pulses. By changing the transformer, we have also obtained 250-kV, 1.7-kA pulses for driving low-impedance relativistic magnetron diodes. The flat-top voltage generated by the modulator is highly desirable for driving RF sources requiring high quality electron beams, such as free-electron lasers (FEL) and cyclotron auto-resonance masers (CARM). The modulator performance in our relativistic magnetron and CARM experiments is described

Additional details

Publishing Information

Journal Title
IEEE Transactions on Electron Devices
Journal Volume
38
Journal Issue
4
Series
IEEE Trans. Electron Devices.
Journal Page Range
817-821
ISSN
0018-9383
CODEN
IETDA