Published April 1985
| Version v1
Journal article
Ion source for layer analysis of thin films
Description
The ion source described here consists of a system of metal rings with calibrated inner diameters. One of two different ionizers is used--one with cold cathode, the other with directly heated cathode. The ion beam is formed by a system of two isolated lenses separated by a cutoff diaphragm. At a gas flow rate of 10-4 liter X torr/sec the beam current is 1 Mu A at theta 0.5 mm at a distance of 50 mm from the source exit. The source can be used for secondary ion mass spectroscopy and ion-Auger spectroscopy
Additional details
Publishing Information
- Journal Title
- Instrum. Exp. Tech. (Engl. Transl.)
- Journal Volume
- 27
- Journal Issue
- 5
- Series
- Instrum. Exp. Tech. (Engl. Transl.).
- Journal Page Range
- 1208-1210
- ISSN
- 0020-4412
- CODEN
- INETA
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 18006271
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Descriptors DEI
- AUGER ELECTRON SPECTROSCOPY; BEAM CURRENTS; BEAM PRODUCTION; CATHODES; FLOW RATE; ION BEAMS; ION MICROPROBE ANALYSIS; ION SOURCES; IONIZED GASES; MASS SPECTROSCOPY; PERFORMANCE; SPECIFICATIONS; THIN FILMS
- Descriptors DEC
- BEAMS; CHEMICAL ANALYSIS; CURRENTS; ELECTRODES; ELECTRON SPECTROSCOPY; FILMS; FLUIDS; GASES; MICROANALYSIS; NONDESTRUCTIVE ANALYSIS; SPECTROSCOPY
Optional Information
- Notes
- Translated from Pribory i Tekhnika Eksperimenta, No. 5, pp. 149-151, September-October, 1984.. Cover-to-cover translation of Pribory i Tekhnika Ehksperimenta (USSR).