Hydrogen determination in silicon nitride films by the nuclear recoil method

The highly sensitive nuclear recoil method was used to determine the hydrogen concentration in silicon nitride films deposited by the ammonolysis of monosilane. Combination of the data obtained using this method with internal reflection spectroscopy data allowed estimation of the absorption cross section epsilon(lambda = 3.3 μm) for the N-H bonds present in the films. The value of (5.9 +- 1.2) x 10-20 cm2 obtained for epsilon(lambda = 3.3 μm) is more reliable than values reported previously. (Auth.)