Effect of annealing temperature on micro-structural, optical and electrical characterization of nanostructured V2O5 thin films prepared by spray pyrolysis technique

Highlights: • Nanostructured V2O5 thin films were deposited on glass substrates using spray pyrolysis technique. • Deposited thin films were annealed at different temperatures (350–450 °C) for 1 h. • All nanostructured thin films have observed good crystallinity and varied with annealing temperature. • The film which is annealed at a temperature of 450 °C is showing improved properties. • This optimized film will be very use full in thermo-chromic devices. -- Abstract: V₂O₅ thin films were deposited by the spray pyrolysis method on pre-cleaned glass substrates at 300 °C and also these thin films were annealed for 1 h from 350 °C to 450 °C. Ammonium vanadate (NH₄VO₃) and Triton X-100 were used as starting materials were dissolved in water solvent. Structural, Optical, morphological and electrical properties were analyzed by using X-ray diffraction (XRD), UV–Vis spectroscopy, scanning electron microscopy (SEM) and two probe method respectively. X-ray diffraction studies have shown the thin films were composed of V₂O₅ with orthorhombic structure and oriented along (100) direction at high annealing temperatures. The SEM images reveal the morphological changes in films while increase the annealing temperature. The effect of annealing temperature on optical and electrical properties of the V₂O₅ thin films have been investigated and reported.