Published November 9, 2011 | Version v1
Journal article

Measuring two dimensional strain state of AlN quantum dots in GaN nanowires by nanobeam electron diffraction

  • 1. FEI Company, Achtseweg Noord 5, 5600 GG Eindhoven (Netherlands)
  • 2. Institut Néel, CNRS, BP 166, 25 rue des Martyrs, 38042 Grenoble (France)
  • 3. CEA-Grenoble, 38054 Grenoble (France)

Description

Nanobeam electron diffraction (NBED or NBD) is a transmission electron microscope (TEM) based technique able to measure strain with nanometre spatial resolution. This technique is especially well designed for nanostructures as reference diffraction pattern can be acquired anywhere on the sample. NBED is here applied on AlN/GaN superlattices grown on SiC and results compared to finite element simulations in order to assess the accuracy of the method. Strain profiles were then acquired with success on GaN nanowires presenting 3 nm GaN inclusions separated by 3 nm thick AlN.

Availability note (English)

Available from http://dx.doi.org/10.1088/1742-6596/326/1/012047

Additional details

Publishing Information

Journal Title
Journal of Physics. Conference Series (Online)
Journal Volume
326
Journal Issue
1
Journal Page Range
[4 p.]
ISSN
1742-6596

Conference

Title
17. international conference on microscopy of semiconducting materials 2011
Dates
4-7 Apr 2011
Place
Cambridge (United Kingdom)