Published December 2010 | Version v1
Journal article

Gate induced superconductivity in layered material based electronic double layer field effect transistors

  • 1. Institute for Materials Research, Tohoku University, Sendai 980-8577 (Japan)

Description

Applying the principle of field effect transistor to layered materials provides new opportunities to manipulate their electronic properties for interesting sciences and applications. Novel gate dielectrics like electronic double layer (EDL) formed by ionic liquids are demonstrated to achieve an electrostatic surface charge accumulation on the order of 1014 cm-2. To realize electric field-induced superconductivity, we chose a layered compound: ZrNCl, which is known to be superconducting by introducing electrons through intercalation of alkali metals into the van der Waals gaps. A ZrNCl-based EDL transistor was micro fabricated on a thin ZrNCl single crystal made by mechanical micro-cleavage. Accumulating charges using EDL gate dielectrics onto the channel surface of ZrNCl shows effective field effect modulation of its electronic properties. Sheet resistance of ZrNCl EDL transistor is reduced by applying a gate voltage from 0 to 4.5 V. Temperature dependence of sheet resistance showed clear evidence of metal-insulator transition upon gating, observed at a gate voltage higher than 3.5 V. Furthermore, gate-induced superconductivity took place after metal-insulator transition when the transistor is cooled down to about 15 K.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.physc.2009.10.140

Additional details

Identifiers

DOI
10.1016/j.physc.2009.10.140;
PII
S0921-4534(09)00698-4;

Publishing Information

Journal Title
Physica. C, Superconductivity
Journal Volume
470
Journal Issue
Suppl.1
Journal Page Range
p. S682-S684
ISSN
0921-4534
CODEN
PHYCE6

Conference

Title
9. international conference on materials and mechanisms of superconductivity
Dates
7-12 Sep 2009
Place
Tokyo (Japan)

Optional Information

Copyright
Copyright (c) 2009 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.