Published April 14, 1992 | Version v1
Patent

Hollow electrode plasma excitation source

Description

A plasma source incorporates a furnace as a hollow anode, while a coaxial cathode is disposed therewithin. The source is located in a housing provided with an ionizable gas such that a glow discharge is produced between anode and cathode. Radiation or ionic emission from the glow discharge characterizes a sample placed within the furnace and heated to elevated temperatures. 5 figs

Availability note (English)

Available from Patent and Trademark Office, Box 9, Washington, DC 20232 (United States).

Additional details

Publishing Information

Imprint Pagination
[10 p.].
IPC:
Int. Cl. H01J 49/04; H05H 1/24.
IPC
Int. Cl. H01J 49/04; H05H 1/24.
Patent number
US patent document 5,105,123/A/

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
25073385
Subject category
S07: ISOTOPES AND RADIATION SOURCES;
Resource subtype / Literary indicator
Non-conventional Literature
Descriptors DEI
DESIGN; GLOW DISCHARGES; ION EMISSION; IONIZATION; PLASMA PRODUCTION
Descriptors DEC
ELECTRIC DISCHARGES; EMISSION