Metallization of warm dense SiO2 studied by XANES spectroscopy
Creators
- 1. Laboratoire pour l,Utilisation des Lasers Intenses - LULI, Ecole Polytechnique, CNRS, CEA, UPMC, 91128 Palaiseau, (France)
- 2. LUTH, Observatoire de Paris, CNRS, Universite Paris Diderot, 92195 Meudon, (France)
- 3. Centre Lasers Intenses et Applications - CELIA, CNRS, CEA, Universite Bordeaux 1, 33405 Talence, (France)
- 4. Departement de Physique Theorique et Appliquee, CEA, 91680 Bruyere-le-Chatel, (France)
Description
We investigate the evolution of the electronic structure of fused silica in a dense plasma regime using time-resolved x-ray absorption spectroscopy. We use a nanosecond (ns) laser beam to generate a strong uniform shock wave in the sample and a picosecond (ps) pulse to produce a broadband x-ray source near the Si K edge. By varying the delay between the two laser beams and the intensity of the ns beam, we explore a large thermodynamical domain with densities varying from 1 to 5 g/cm3 and temperatures up to 5 eV. In contrast to normal conditions where silica is a well-known insulator with a wide band gap of 8.9 eV, we find that shocked silica exhibits a pseudo-gap as a semimetal throughout this thermodynamical domain. This is in quantitative agreement with density functional theory predictions performed using the generalized gradient approximation. (authors)
Availability note (English)
Available from doi: http://dx.doi.org/10.1103/PhysRevLett.113.116404Additional details
Identifiers
Publishing Information
- Journal Title
- Physical Review Letters
- Journal Volume
- 113
- Journal Page Range
- p. 116404.1-116404.5
- ISSN
- 0031-9007
INIS
- Country of Publication
- United States
- Country of Input or Organization
- France
- INIS RN
- 48042188
- Subject category
- S36: MATERIALS SCIENCE; S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- ABSORPTION SPECTROSCOPY; DENSITY FUNCTIONAL METHOD; ELECTRONIC STRUCTURE; LASERS; SHOCK WAVES; SILICA; SILICON OXIDES; TIME RESOLUTION
- Descriptors DEC
- CALCULATION METHODS; CHALCOGENIDES; MINERALS; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; RESOLUTION; SILICON COMPOUNDS; SPECTROSCOPY; TIMING PROPERTIES; VARIATIONAL METHODS
Optional Information
- Notes
- 40 refs.