Pulse explosion ion beam source with one pulse regime supply for surface modification of materials

A variant of explosion ion beam source with one positive pulse supply for surface modification of materials is described. Ion source consists of vacuum diode and pulse generator Arcadiev-Marx type. Residual gas pressure was p∼5x10-5 torr in the diode. The sort of ions was fixed by materials initiator anode plasma. The produce carbon ions a carbon-fibrous initiator is used for niobium and titanium-niobium-titanium cable with picking copper matrix. The ions density current regulation is realized by by change of diode gap in the correspondence with Child-Langmuir law. For carbon ions the current density is j∼6A/cm2 for voltage U∼100kV and j∼32A/cm2 for voltage U∼300 kV. 7 refs.; 1 fig