Electrical characterization and ammonia sensing properties of MoS2/Si p–n junction
Creators
- 1. College of Science, China University of Petroleum, Qingdao, Shandong 266580 (China)
- 2. State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054 (China)
Description
Highlights: • MoS2/Si p–n junctions were fabricated firstly. • The junction exhibited obvious sensing properties to NH3 at room temperature. • Different response behaviors were observed in different voltage range. • Sensing mechanisms of the MoS2/Si p–n junction were proposed. - Abstract: Molybdenum disulfide (MoS2) thin films are grown on p-type Si substrates by dc magnetron sputtering technique and MoS2/Si p–n junctions are fabricated. The typical oscillating modes of E12g and A1g are shown in the Raman spectrum of the MoS2 film. Atomic force microscopy illustrates that the surface of the deposited MoS2 film is composed of dense nano-level grains. The electrical characteristics of the junction are investigated. The current–voltage curves of the p–n junction show good rectifying characteristics and change dramatically with temperature. The fabricated junction exhibits obvious sensing properties to ammonia gas (NH3) at room temperature. Especially, the sensing behaviors can be tuned by external electrical fields. In the forward voltage range, the currents increase significantly after the junction is exposed to NH3 and the response increases with increasing voltage. The sensing performance is featured by a high sensitivity (∼769.2% toward 9000 ppm and ∼19.1% toward 200 ppm), and fast response and recovery (∼5.0 s). The response in reverse voltage range is contrary to that in forward voltage range and decreases with increasing the reverse voltage. We also study the dependence of the sensing response on NH3 concentration. An almost linear correlation is obtained in the measured range of NH3 concentration. The sensing mechanisms of the MoS2/Si p–n junction are proposed
Availability note (English)
Available from http://dx.doi.org/10.1016/j.jallcom.2015.01.111Additional details
Identifiers
- DOI
- 10.1016/j.jallcom.2015.01.111;
- PII
- S0925-8388(15)00184-X;
Publishing Information
- Journal Title
- Journal of Alloys and Compounds
- Journal Volume
- 631
- Journal Page Range
- p. 105-110
- ISSN
- 0925-8388
- CODEN
- JALCEU
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 47016648
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- AMMONIA; ATOMIC FORCE MICROSCOPY; CONCENTRATION RATIO; CORRELATIONS; ELECTRIC FIELDS; HETEROJUNCTIONS; MAGNETRONS; MOLYBDENUM SULFIDES; PERFORMANCE; P-N JUNCTIONS; RAMAN SPECTRA; SENSITIVITY; SENSORS; SILICON; SPUTTERING; SUBSTRATES; SURFACES; TEMPERATURE RANGE 0273-0400 K; THIN FILMS
- Descriptors DEC
- CHALCOGENIDES; DIMENSIONLESS NUMBERS; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; FILMS; HYDRIDES; HYDROGEN COMPOUNDS; MICROSCOPY; MICROWAVE EQUIPMENT; MICROWAVE TUBES; MOLYBDENUM COMPOUNDS; NITROGEN COMPOUNDS; NITROGEN HYDRIDES; REFRACTORY METAL COMPOUNDS; SEMICONDUCTOR JUNCTIONS; SEMIMETALS; SPECTRA; SULFIDES; SULFUR COMPOUNDS; TEMPERATURE RANGE; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2015 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.