Published July 2009
| Version v1
Journal article
Novel mixed-voltage I/O buffer with thin-oxide CMOS transistors
Creators
- 1. Key Laboratory of Microelectronic Devices and Circuits, Institute of Microelectronics, Peking University, Beijing 100871 (China)
Description
This paper presents a novel mixed-voltage I/O buffer without an extra dual-oxide CMOS process. This mixed-voltage I/O buffer with a simplified circuit scheme can overcome the problems of leakage current and gate-oxide reliability that the conventional CMOS I/O buffer has. The design is realized in a 0.13-μm CMOS process and the simulation results show a good performance increased by ∼34% with respect to the product of power consumption and speed.
Availability note (English)
Available from http://dx.doi.org/10.1088/1674-4926/30/7/075001Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Semiconductors
- Journal Volume
- 30
- Journal Issue
- 7
- Journal Page Range
- [3 p.]
- ISSN
- 1674-4926
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 42068513
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; S36: MATERIALS SCIENCE;
- Descriptors DEI
- BUFFERS; DESIGN; ELECTRIC POTENTIAL; LEAKAGE CURRENT; OXIDES; SEMICONDUCTOR MATERIALS; SIMULATION; TRANSISTORS
- Descriptors DEC
- CHALCOGENIDES; CURRENTS; ELECTRIC CURRENTS; MATERIALS; OXYGEN COMPOUNDS; SEMICONDUCTOR DEVICES