Published July 2009 | Version v1
Journal article

Novel mixed-voltage I/O buffer with thin-oxide CMOS transistors

  • 1. Key Laboratory of Microelectronic Devices and Circuits, Institute of Microelectronics, Peking University, Beijing 100871 (China)

Description

This paper presents a novel mixed-voltage I/O buffer without an extra dual-oxide CMOS process. This mixed-voltage I/O buffer with a simplified circuit scheme can overcome the problems of leakage current and gate-oxide reliability that the conventional CMOS I/O buffer has. The design is realized in a 0.13-μm CMOS process and the simulation results show a good performance increased by ∼34% with respect to the product of power consumption and speed.

Availability note (English)

Available from http://dx.doi.org/10.1088/1674-4926/30/7/075001

Additional details

Publishing Information

Journal Title
Journal of Semiconductors
Journal Volume
30
Journal Issue
7
Journal Page Range
[3 p.]
ISSN
1674-4926

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
42068513
Subject category
S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; S36: MATERIALS SCIENCE;
Descriptors DEI
BUFFERS; DESIGN; ELECTRIC POTENTIAL; LEAKAGE CURRENT; OXIDES; SEMICONDUCTOR MATERIALS; SIMULATION; TRANSISTORS
Descriptors DEC
CHALCOGENIDES; CURRENTS; ELECTRIC CURRENTS; MATERIALS; OXYGEN COMPOUNDS; SEMICONDUCTOR DEVICES