Auger electron spectroscopy and ion sputter profiles of oxides on aluminium

To check the validity of those assumptions needed to relate the Auger peak to peak height (APPH) to quantitative elemental concentrations in oxide films, oxide films on aluminium were monitored by AES during ion-sputter-etching. Before and after film profiling with AES, contour maps of film thickness were obtained with ellipsometry. Ion-sputter-AES profiles are entirely misleading if interpreted as quantitative concentration profiles, but are very informative as to qualitative analysis and when properly understood reveal physical and chemical non-isotropy within the films. (Auth.)