Published June 1974
| Version v1
Journal article
Incorporation of foreign ions in anodic tantalum oxide layers
Creators
- 1. Siemens A.G., Muenchen (F.R. Germany). Zentrallaboratorien fuer Nachrichtentechnik
- 2. Siemens A.G., Muenchen (F.R. Germany). Grundlagenentwicklung fuer Bauelemente
- 3. Siemens A.G., Muenchen (F.R. Germany). Forschungslaboratorium
Description
no abstract available
Additional details
Additional titles
- Original title (German)
- Einbau von Fremdionen in anodischen Tantaloxidschichten
Publishing Information
- Journal Title
- Metall
- Journal Volume
- 28
- Journal Issue
- 6
- Series
- Metall.
- Journal Page Range
- 592-596
INIS
- Country of Publication
- Germany
- Country of Input or Organization
- Germany
- INIS RN
- 6179873
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ANODES; CHEMICAL COMPOSITION; CHROMIUM OXIDES; CHROMIUM 51; DOPED MATERIALS; ELECTROCHEMISTRY; IONS; LAYERS; OXIDATION; PH VALUE; PHOSPHATES; PHOSPHORUS 32; RADIOACTIVITY; TANTALUM OXIDES; TRACER TECHNIQUES
- Descriptors DEC
- BETA DECAY RADIOISOTOPES; BETA-MINUS DECAY RADIOISOTOPES; CHALCOGENIDES; CHARGED PARTICLES; CHEMICAL REACTIONS; CHROMIUM COMPOUNDS; CHROMIUM ISOTOPES; DAYS LIVING RADIOISOTOPES; ELECTRODES; ELECTRON CAPTURE RADIOISOTOPES; EVEN-ODD NUCLEI; INTERMEDIATE MASS NUCLEI; ISOTOPE APPLICATIONS; ISOTOPES; LIGHT NUCLEI; NUCLEI; ODD-ODD NUCLEI; OXIDES; OXYGEN COMPOUNDS; PHOSPHORUS COMPOUNDS; PHOSPHORUS ISOTOPES; RADIOISOTOPES; TANTALUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Notes
- 9 figs.; 8 refs.