Published 1989 | Version v1
Book Metadata-only

Measurement of accelerated plasma in plasma focus by laser differential interferometry methods

Creators

  • 1. Gas Discharge and Plasma Lab., Dept. of Electrical Engineering, Tsinghua Univ., Beijing 100084 (China)

Description

In this paper the run-down phase of the discharge in a plasma focus device is studied by means of differential interferometry. The dynamics and the structure of the plasma sheath were measured with interferograph under different gas pressure of hydrogen. The relation between X-ray yield and the sheath structure is studied. The experimental results are presented

Additional details

Publishing Information

Publisher
IEEE Service Center.
Imprint Place
Piscataway, NJ (USA)
Imprint Title
Proceedings of the 1989 IEEE international conference on plasma science (Abstracts)
Imprint Pagination
180 p.
Journal Page Range
p. 103.

Conference

Title
Institute of Electrical and Electronics Engineers international conference on plasma science.
Dates
22-24 May 1989.
Place
Buffalo, NY (USA).

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
21041232
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY; S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Resource subtype / Literary indicator
Conference, Numerical Data
Descriptors DEI
DYNAMICS; ELECTRIC DISCHARGES; EXPERIMENTAL DATA; HYDROGEN; INTERFEROMETRY; LASER-PRODUCED PLASMA; PLASMA ACCELERATION; PLASMA DIAGNOSTICS; PLASMA FOCUS; PLASMA SHEATH; THICKNESS; X RADIATION
Descriptors DEC
ACCELERATION; DATA; DIMENSIONS; ELECTROMAGNETIC RADIATION; ELEMENTS; INFORMATION; IONIZING RADIATIONS; MECHANICS; NONMETALS; NUMERICAL DATA; PLASMA; RADIATIONS

Optional Information

Secondary number(s)
CONF-8905184--.