Published January 15, 2007 | Version v1
Journal article

Effects of water plasma immersion ion implantation on surface electrochemical behavior of NiTi shape memory alloys in simulated body fluids

  • 1. Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong (China)
  • 2. Department of Materials Science and Engineering, Southeast University, Nanjing 210018 (China)
  • 3. Division of Spine Surgery, Department of Orthopaedics and Traumatology, University of Hong Kong, Pokfulam, Hong Kong (China)

Description

Water plasma immersion ion implantation (PIII) was conducted on orthopedic NiTi shape memory alloy to enhance the surface electrochemical characteristics. The surface composition of the NiTi alloy before and after H2O-PIII was determined by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) was utilized to determine the roughness and morphology of the NiTi samples. Potentiodynamic polarization tests and electrochemical impedance spectroscopy (EIS) were carried out to investigate the surface electrochemical behavior of the control and H2O-PIII NiTi samples in simulated body fluids (SBF) at 37 deg. C as well as the mechanism. The H2O-PIII NiTi sample showed a higher breakdown potential (E b) than the control sample. Based on the AFM results, two different physical models with related equivalent electrical circuits were obtained to fit the EIS data and explain the surface electrochemical behavior of NiTi in SBF. The simulation results demonstrate that the higher resistance of the oxide layer produced by H2O-PIII is primarily responsible for the improvement in the surface corrosion resistance

Additional details

Identifiers

DOI
10.1016/j.apsusc.2006.07.008;
PII
S0169-4332(06)00936-6;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
253
Journal Issue
6
Journal Page Range
p. 3154-3159
ISSN
0169-4332
CODEN
ASUSEE

Optional Information

Copyright
Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.