Ion implantation of semiconductor devices

The impact of ion implantation on the semiconductor industry is assessed and the advantages of the technique considered. The main applications of ion implantation are considered under two headings: the substitution of implantation for diffusion using the technique simply as a source of dopant atoms, and the use of particular unique features of implantation to make improved device structures. It is shown that the impact of ion implantation is not seen simply in current device catalogues, but in devices under development and in an increasing understanding of the solid state. (U.K.)