Published April 15, 2004 | Version v1
Journal article

Characterization and modeling of tungsten nanoparticles generated by laser-assisted chemical vapor deposition

  • 1. Angstroem Laboratory, Department of Solid State Physics, Uppsala University, Box 534, SE-751 21 Uppsala (Sweden)
  • 2. Angstroem Laboratory, Department of Analytical Materials Physics, Uppsala University, Box 534, SE-751 21 Uppsala (Sweden)
  • 3. Department of Optics and Quantum Electronics, University of Szeged, Box 406, H-6721 (Hungary)
  • 4. Angstroem Laboratory, Department of Materials Chemistry, Uppsala University, Box 538, SE-751 21 Uppsala (Sweden)

Description

Tungsten nanoparticles were generated by photolytical (UV) laser-activated chemical vapor deposition from WF6/H2/Ar gas mixture. Emission spectroscopy of thermal radiation allowed temperature determination of the nanoparticles while varying the laser fluence. A model including known cooling mechanisms was used to calculate the laser-induced temperature as a function of time and laser fluence, where the only fitting parameter was the absorption efficiency of the particles, obtained from measured temperatures. Size decrease of the particles due to evaporation was modeled at different laser fluences, and connected to size-distribution measurements from transmission electron microscopy micrographs, where a maximum geometric mean diameter (for the experimental conditions used) of 10 nm was observed at a laser fluence of ∼120 mJ/cm2. Measurements and the model calculations showed that the laser-excited particles reached the melting temperature of tungsten at ∼95 mJ/cm2. Above ∼130 mJ/cm2, very high rates of evaporation of W atoms were found, resulting in a decrease in size of the deposited particles. Crystalline, metastable β-W nanoparticles were found above ∼100 mJ/cm2 by both electron and x-ray diffraction. Below fluences of ∼100 mJ/cm2, i.e., corresponding to the value necessary for melting, amorphous nanoparticles were obtained

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
95
Journal Issue
8
Journal Page Range
p. 4408-4414
ISSN
0021-8979
CODEN
JAPIAU

Optional Information

Notes
(c) 2004 American Institute of Physics.