Published June 1, 2015 | Version v1
Journal article

Thermally enhanced perpendicular magnetic anisotropy behaviors of ultrathin [Co/Pd]n multilayers via NiOx capping layer

  • 1. Nano Quantum Electronics Lab, Department of Electronics and Computer Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of)
  • 2. Novel Functional Materials and Devices Laboratory, Research Institute for Natural Science, Department of Physics, Hanyang University, Seoul 133-791 (Korea, Republic of)
  • 3. Division of Nano-Scale Semiconductor Engineering, Hanyang University, Seoul 133-791 (Korea, Republic of)

Description

We report the enhanced perpendicular magnetic anisotropy (PMA) features of ultrathin [Co/Pd]3 multilayers (MLs) employing a NiOx insertion layer at high annealing temperatures. Thermally enhanced PMA in [Co/Pd]3/NiOx (capping layer) MLs were achieved at a specific capping layer thickness, while no PMA responses were observed for a NiOx (buffer layer)/[Co/Pd]3 ML, regardless of NiOx thickness. X-ray diffraction observations, including rocking curves, identified the relatively different crystalline characteristics of the NiOx capping and buffer layers. Origin of the enhanced PMAs of [Co/Pd]3 MLs containing a NiOx capping layer is described based on the NiOx capping effect possibly providing additional Co/Oxide i-PMA under high-temperature annealing

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
106
Journal Issue
22
Journal Page Range
p. 222404-222404.5
ISSN
0003-6951
CODEN
APPLAB

Optional Information

Notes
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