Published November 1993 | Version v1
Journal article Metadata-only

Stability and formation kinetics of TiN and silicides in the Ti/Si3N4 diffusion couple

Creators

  • 1. Helsinki Univ. of Technology, Dept. of Materials Science and Technology, Espoo (Finland)

Description

Reactions in Ti/Si3N4 and TiN/Si diffusion couples annealed in the temperature range of 1000-1200 C were studied theoretically as well as experimentally with SEM/EPMA technique. Isothermal sections of the Ti-Si-N system were calculated using the most recent thermodynamic data. Calculations showed that TiN and Si react with each other and form Si3N4 and TiSi2, parallel to the experimental studies. Correspondingly, results from the Ti/Si3N4 couple were in good accordance with calculated phase equilibria. (orig.)

Additional details

Publishing Information

Journal Title
Journal de Physique. 4
Journal Volume
3
Journal Issue
7,pt.2
Journal Page Range
p. 1069-1072.
ISSN
1155-4339
CODEN
JPICEI

Conference

Title
3. European conference on advanced materials and processes (EUROMAT-3).
Original Conference Title
3. Conference Europeenne sur les Materiaux et les Procedes Avances
Dates
8-10 Jun 1993.
Place
Paris (France).

INIS

Country of Publication
France
Country of Input or Organization
France
INIS RN
25061386
Subject category
S36: MATERIALS SCIENCE; S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ANNEALING; BRAZING; DIFFUSION; DIFFUSION WELDING; EQUILIBRIUM; PHASE DIAGRAMS; SCANNING ELECTRON MICROSCOPY; SILICON NITRIDES; TEMPERATURE DEPENDENCE; TEMPERATURE RANGE 1000-4000 K; THERMODYNAMICS; TITANIUM; TITANIUM NITRIDES; TITANIUM SILICIDES; X-RAY DIFFRACTION
Descriptors DEC
COHERENT SCATTERING; DIAGRAMS; DIFFRACTION; ELECTRON MICROSCOPY; ELEMENTS; FABRICATION; HEAT TREATMENTS; INFORMATION; JOINING; METALS; MICROSCOPY; NITRIDES; NITROGEN COMPOUNDS; PNICTIDES; SCATTERING; SILICIDES; SILICON COMPOUNDS; TEMPERATURE RANGE; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS; TRANSITION ELEMENTS; WELDING