Published June 1988 | Version v1
Journal article Metadata-only

On the structure of Ni-S electrodeposits produced by direct current and pulse current methods

Creators

  • 1. Osaka Prefectural Univ., Sakai (Japan). Coll. of Engineering
  • 2. Himeji Inst. of Tech., Hyogo (Japan)
  • 3. Tokuyama Soda Co. Ltd., Yamaguchi (Japan)

Description

Ni-S electrodeposits have been produced by two plating methods, direct current (dc) and pulse current (pc) methods, in a nickel sulfate bath. The structure of electrodeposited layers has been studied in detail by X-ray diffraction methods. The electrodeposited layer produced by the dc method contains 21 at% S and consists of a microcrystalline state of Ni alloy. However, the layer by the pc method contains 46 at% S and consists of an amorphous alloy. 11 refs.; 2 figs

Additional details

Publishing Information

Journal Title
Mater. Lett.
Journal Volume
6
Journal Issue
10
Series
Mater. Lett.
Journal Page Range
362-364
ISSN
0167-577X
CODEN
MLETD

INIS

Country of Publication
Netherlands
Country of Input or Organization
Netherlands
INIS RN
19098477
Subject category
S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
Descriptors DEI
ELECTRODEPOSITED COATINGS; NICKEL SULFIDES; STRUCTURAL CHEMICAL ANALYSIS; X-RAY DIFFRACTION
Descriptors DEC
CHALCOGENIDES; COATINGS; COHERENT SCATTERING; DIFFRACTION; NICKEL COMPOUNDS; SCATTERING; SULFIDES; SULFUR COMPOUNDS; TRANSITION ELEMENT COMPOUNDS