Published September 2010 | Version v1
Journal article

Atomic resolution improvement by a new method using the second derivative of the intensity function of the reconstructed exit wave of electrons for a thin β-Si3N4 crystal

Creators

  • 1. Department of Physics, Kyungsung University, Busan 608-736 (Korea, Republic of)

Description

This report is an extension of a high-resolution transmission electron microscopy study of β-Si3N4 [0 0 0 1] by Ziegler et al. (2002) . The aim of this work was to obtain a better structural image showing complete resolution of the 95 pm spacing for Si-N dumb-bells. This goal has been achieved with a new method using the second derivative of the intensity function of the reconstructed exit wave. The structure of this thin specimen showed an asymmetric aspect, deviating slightly from a hexagonal lattice.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.scriptamat.2010.05.020

Additional details

Identifiers

DOI
10.1016/j.scriptamat.2010.05.020;
PII
S1359-6462(10)00335-0;

Publishing Information

Journal Title
Scripta Materialia
Journal Volume
63
Journal Issue
5
Journal Page Range
p. 524-527
ISSN
1359-6462
CODEN
SCMAF7

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
45024376
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
ASYMMETRY; CRYSTALS; HEXAGONAL LATTICES; IMAGES; RESOLUTION; SILICON NITRIDES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY
Descriptors DEC
CRYSTAL LATTICES; CRYSTAL STRUCTURE; ELECTRON MICROSCOPY; FILMS; MICROSCOPY; NITRIDES; NITROGEN COMPOUNDS; PNICTIDES; SILICON COMPOUNDS

Optional Information

Copyright
Copyright (c) 2010 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.