Published September 2010
| Version v1
Journal article
Atomic resolution improvement by a new method using the second derivative of the intensity function of the reconstructed exit wave of electrons for a thin β-Si3N4 crystal
Creators
- 1. Department of Physics, Kyungsung University, Busan 608-736 (Korea, Republic of)
Description
This report is an extension of a high-resolution transmission electron microscopy study of β-Si3N4 [0 0 0 1] by Ziegler et al. (2002) . The aim of this work was to obtain a better structural image showing complete resolution of the 95 pm spacing for Si-N dumb-bells. This goal has been achieved with a new method using the second derivative of the intensity function of the reconstructed exit wave. The structure of this thin specimen showed an asymmetric aspect, deviating slightly from a hexagonal lattice.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.scriptamat.2010.05.020Additional details
Identifiers
- DOI
- 10.1016/j.scriptamat.2010.05.020;
- PII
- S1359-6462(10)00335-0;
Publishing Information
- Journal Title
- Scripta Materialia
- Journal Volume
- 63
- Journal Issue
- 5
- Journal Page Range
- p. 524-527
- ISSN
- 1359-6462
- CODEN
- SCMAF7
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 45024376
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ASYMMETRY; CRYSTALS; HEXAGONAL LATTICES; IMAGES; RESOLUTION; SILICON NITRIDES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY
- Descriptors DEC
- CRYSTAL LATTICES; CRYSTAL STRUCTURE; ELECTRON MICROSCOPY; FILMS; MICROSCOPY; NITRIDES; NITROGEN COMPOUNDS; PNICTIDES; SILICON COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2010 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.