Published March 18, 2014
| Version v1
Journal article
THz photoluminescence from n-GaN layers at CW interband excitation
- 1. A. F. Ioffe Physical Technical Institute, 194021, St. Petersburg (Russian Federation)
- 2. Institute of Material Research and Engineering, 119260 (Singapore)
Description
We report on experimental observation and studies of terahertz emission from n-doped GaN films under continuous wave interband photoexcitation at low temperatures. Properties of the terahertz emission testify that the emission is caused by intracenter optical transitions in shallow donors of GaN. The THz intracenter optical transitions are initiated by the interband photoexcitation
Availability note (English)
Available from http://dx.doi.org/10.1088/1742-6596/486/1/012033Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Physics. Conference Series (Online)
- Journal Volume
- 486
- Journal Issue
- 1
- Journal Page Range
- [2 p.]
- ISSN
- 1742-6596
Conference
- Title
- 2. Russia-Japan-USA symposium on the fundamental and applied problems of terahertz devices and technologies
- Acronym
- RJUS TeraTech - 2013
- Dates
- 3-6 Jun 2013
- Place
- Moscow (Russian Federation)
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 46073664
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- DOPED MATERIALS; EXCITATION; FILMS; GALLIUM NITRIDES; LAYERS; N-TYPE CONDUCTORS; PHOTOLUMINESCENCE; TEMPERATURE DEPENDENCE; THZ RANGE
- Descriptors DEC
- EMISSION; ENERGY-LEVEL TRANSITIONS; FREQUENCY RANGE; GALLIUM COMPOUNDS; LUMINESCENCE; MATERIALS; NITRIDES; NITROGEN COMPOUNDS; PHOTON EMISSION; PNICTIDES; SEMICONDUCTOR MATERIALS