Enhanced production of ECR plasma by using pulse mode microwaves on a large bore ECRIS with permanent magnets
Creators
- 1. Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka Univ., 2-1 Ymadaoka, Suita-shi, Osaka, 565-0871 (Japan)
Description
In order to enhance the efficiency of an electron cyclotron resonance (ECR) plasma for a broad and dense ion beam source at low pressure, the magnetic field configuration is constructed by all permanent magnets. By using the pulse mode, we aim at the generation of plasma with parameters that cannot be achieved in the CW mode at microwave frequencies of 11-13GHz, under the constraint of the same average incident microwave powers. It is found that the total beam currents are increased by the pulse mode operation compared with the case of the CW mode. According to probe measurements of the ECR plasma, it is found that the electron density in the pulse mode is larger than that in the CW mode, while the electron temperatures in the pulse mode are lower than that in the CW mode. These results are discussed from the viewpoint of relaxation times obtained on plasma parameters and ECR efficiency. The cause of the beam current increment and operational windows spread due to the pulse mode are also discussed on these parameters suitable to production of molecular/cluster ions.
Additional details
Identifiers
- DOI
- 10.1063/1.4766579;
Publishing Information
- Journal Title
- AIP Conference Proceedings
- Journal Volume
- 1496
- Journal Issue
- 1
- Journal Page Range
- p. 426-429
- ISSN
- 0094-243X
- CODEN
- APCPCS
Conference
- Title
- 19. international conference on ion implantation technology
- Dates
- 25-29 Jun 2012
- Place
- Valladolid (Spain)
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44034814
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- BEAM CURRENTS; ECR ION SOURCES; ELECTRON CYCLOTRON-RESONANCE; ELECTRON DENSITY; ELECTRON TEMPERATURE; ION BEAMS; ION TEMPERATURE; IONS; MAGNETIC FIELD CONFIGURATIONS; MICROWAVE RADIATION; MOLECULAR CLUSTERS; PERMANENT MAGNETS; PLASMA; PLASMA CONFINEMENT; PLASMA DENSITY; PLASMA PRODUCTION; RELAXATION; RF SYSTEMS
- Descriptors DEC
- BEAMS; CHARGED PARTICLES; CONFINEMENT; CURRENTS; CYCLOTRON RESONANCE; ELECTROMAGNETIC RADIATION; EQUIPMENT; ION SOURCES; MAGNETS; RADIATIONS; RESONANCE
Optional Information
- Notes
- (c) 2012 American Institute of Physics