Published November 2004
| Version v1
Journal article
Study of preferred orientation of zinc oxide films on the 64 deg. LiNbO3 substrates and their applications as liquid sensors
- 1. Department of Electrical Engineering, Tung Nan Institute of Technology, Taipei, Taiwan (China)
- 2. Department of Nursing, Shu-Zen College of medicine and management, Kaohsiung, Taiwan (China)
- 3. Department of Electrical Engineering, National Cheng Kung University, Tainan, Taiwan (China)
Description
The preferred (002) orientation of zinc oxide (ZnO) films has been grown and demonstrated on 64 deg. LiNbO3 substrates using a rf magnetron sputtering system. The film orientations and crystallinity are strongly dependent on the rf power, total chamber pressure, ratio of argon to oxygen, and substrate temperature. We investigated the crystalline structure of the films by x-ray diffraction and scanning electron microscopy. Highly oriented (002) films were obtained under a total chamber pressure of 1.33 Pa, containing 40% oxygen and 60% argon, and a substrate temperature around 120 deg. C. Love-wave devices based on this structure (ZnO/IDTs/64 deg. LiNbO3) are presented
Additional details
Identifiers
- DOI
- 10.1116/1.1809125;
Publishing Information
- Journal Title
- Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
- Journal Volume
- 22
- Journal Issue
- 6
- Journal Page Range
- p. 2424-2430
- ISSN
- 0734-2101
- CODEN
- JVTAD6
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 36080116
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S36: MATERIALS SCIENCE;
- Descriptors DEI
- ARGON; CRYSTAL GROWTH; CRYSTAL STRUCTURE; GRAIN ORIENTATION; LITHIUM COMPOUNDS; MAGNETRONS; NIOBATES; OXYGEN; SCANNING ELECTRON MICROSCOPY; SPUTTERING; THIN FILMS; X-RAY DIFFRACTION; ZINC OXIDES
- Descriptors DEC
- ALKALI METAL COMPOUNDS; CHALCOGENIDES; COHERENT SCATTERING; DIFFRACTION; ELECTRON MICROSCOPY; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; FILMS; FLUIDS; GASES; MICROSCOPY; MICROSTRUCTURE; MICROWAVE EQUIPMENT; MICROWAVE TUBES; NIOBIUM COMPOUNDS; NONMETALS; ORIENTATION; OXIDES; OXYGEN COMPOUNDS; RARE GASES; REFRACTORY METAL COMPOUNDS; SCATTERING; TRANSITION ELEMENT COMPOUNDS; ZINC COMPOUNDS
Optional Information
- Notes
- (c) 2004 American Vacuum Society