Published October 2009 | Version v1
Journal article

Thermally induced defects in silicon irradiated with fast neutrons

  • 1. Institute of Electron Technology, Al. Lotnikow 46, 02-668 Warsaw (Poland)
  • 2. Institute of Electronic Materials Technology, 01-919 Warsaw (Poland)
  • 3. Institute of Atomic Energy, 05-400 Otwock-Swierk (Poland)
  • 4. Institute of Physics, PAS, Al. Lotnikow 32/46, 02-668 Warsaw (Poland)
  • 5. University of Athens, Athens 15784 (Greece)
  • 6. HASYLAB at DESY, D-22603 Hamburg (Germany)

Description

Defect structure of Czochralski grown (1 1 1) oriented silicon single crystals (Cz-Si), irradiated with fast neutrons (energy 5 MeV, dose 5x1016 cm-2) and annealed at up to 1400 K, also under hydrostatic Ar pressure equal to 1.1 GPa, has been investigated by high-resolution X-ray diffraction and synchrotron topography at HASY Laboratory. The annealing, especially at 1270 and 1400 K, results in precipitation of interstitial oxygen and creation of extended defects. A thermally induced oxygen precipitation at high temperatures-pressures in neutron-irradiated Cz-Si reveals the irradiation-related history of investigated samples.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.radphyschem.2009.03.087

Additional details

Identifiers

DOI
10.1016/j.radphyschem.2009.03.087;
PII
S0969-806X(09)00236-9;

Publishing Information

Journal Title
Radiation Physics and Chemistry
Journal Volume
78
Journal Issue
10
Journal Page Range
p. S67-S70
ISSN
0969-806X
CODEN
RPCHDM

Conference

Title
Workshop on use of Monte Carlo techniques for design and analysis of radiation detectors
Dates
15-17 Sep 2006
Place
Coimbra (Portugal)

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
41020773
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ANNEALING; CRYSTAL DEFECTS; FAST NEUTRONS; IRRADIATION; MEV RANGE 01-10; MONOCRYSTALS; PRECIPITATION; PRESSURE RANGE GIGA PA; SILICON; TEMPERATURE RANGE 1000-4000 K; X-RAY DIFFRACTION
Descriptors DEC
BARYONS; COHERENT SCATTERING; CRYSTAL STRUCTURE; CRYSTALS; DIFFRACTION; ELEMENTARY PARTICLES; ELEMENTS; ENERGY RANGE; FERMIONS; HADRONS; HEAT TREATMENTS; MEV RANGE; NEUTRONS; NUCLEONS; PRESSURE RANGE; SCATTERING; SEMIMETALS; SEPARATION PROCESSES; TEMPERATURE RANGE

Optional Information

Copyright
Copyright (c) 2009 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.