The impact of frequency mixing on sheath properties: Ion energy distribution and Vdc/Vrf interaction

A dual frequency rf sheath is analyzed using a simple rf sheath model to study the interaction between the two driving rf currents and their effect on sheath parameters. A symmetric rf discharge with defined electron density and dc sheath potential is modeled using a sharp boundary sheath approximation. Three results of this study are reported: (1) reproduction of trends in ion energy distribution functions predicted and measured in previous studies (2) a frequency-mixing-dependent relationship between the dc sheath potential and applied rf potential, and (3) an additional asymmetry in the ion energy distribution function generated by the intermodulation components resulting from the nonlinear sheath