Published September 1978
| Version v1
Report
Ion implantation (a bibliography with abstracts). Report for 1964--August 1978
Description
The cited reports discuss research concerning ion implantation, particularly as applied to the microelectronics field. Specific topics include equipment, techniques, semiconductor doping, and radiation effects on material properties
Availability note (English)
MF available from INIS under the Report Number; Available from NTIS.Additional details
Publishing Information
- Imprint Pagination
- 299 p.
- Report number
- NTIS/PS--78/1031
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 10472774
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- DOPED MATERIALS; GALLIUM ARSENIDES; ION IMPLANTATION; MICROELECTRONICS; PHYSICAL RADIATION EFFECTS; SEMICONDUCTOR DEVICES; SEMICONDUCTOR JUNCTIONS; SEMICONDUCTOR MATERIALS; SILICON OXIDES
- Descriptors DEC
- ARSENIC COMPOUNDS; ARSENIDES; CHALCOGENIDES; GALLIUM COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; RADIATION EFFECTS; SILICON COMPOUNDS